99.999% Si Sputtering Target with Copper Backing — Stable Deposition for AR Film and Low-E Glass
High-Purity Silicon, Engineered for Stable Thin-Film Deposition
Silicon sputtering targets are the source material behind some of the most widely used functional films in modern manufacturing — from SiO2 and Si3N4 barrier layers to anti-reflective coatings on touch panels and low-emissivity (Low-E) glass.
Our 5N silicon planar sputtering target, bonded to a copper backing plate, is built for coaters that demand stable arc-free deposition, consistent film properties and reliable thermal transfer over long production campaigns.
Bonding a silicon target to a machined copper backing plate is not an optional extra — it directly affects coating economics:
Efficient heat dissipation — silicon has relatively low thermal conductivity; the copper backing plate draws deposition heat away from the brittle ceramic target, reducing the risk of thermal cracking during long sputtering runs.
Secure, low-resistance bonding — a well-executed target-to-backing bond keeps electrical and thermal contact stable across the full target surface, supporting uniform plasma and consistent film thickness.
Cooling compatibility — the copper plate interfaces directly with the cathode's cooling circuit, protecting both the target and the coater.
Higher material utilization — a flat, well-bonded target can be sputtered down to a thinner residue before replacement, cutting cost per square meter.
Custom Sizes & Bonding Service
Beyond the standard specification, we supply silicon planar targets in custom dimensions, with professional target-to-backing-plate bonding (indium solder / elastomer bonding available depending on application). Tell us your coater model, target dimensions and bonding preference — our engineers will recommend the right configuration.
Request a Quote
Looking for a dependable silicon target supplier for your coating line?
Send us your target drawing or specification sheet — we typically respond with pricing and delivery terms within one business day.
Recently Posted
-
AZO Sputtering Target Manufacturer in China for Transparent Conductive Films
October 27, 2026Aluminum-doped zinc oxide (AZO) is one of the core functional oxide targets for transparent conductive oxide (TCO) thin films, and
Read More -
Rotatable CuZn Sputtering Targets for Pure Copper Film Deposition
October 22, 2026Wherever a pure copper film is needed, copper-zinc alloy targets are the material of choice. Copper delivers high electrical condu
Read More -
Zn‑Sn Sputtering Targets for Energy‑Saving & Smart Glass Industry
October 19, 2026Zn‑Sn alloy sputtering targets are key raw materials for magnetron sputtering coating, widely used in the manufacturing of energy‑
Read More -
UV Tech Material LTD. – Company Profile and Product Information
October 19, 2026UV Tech Material LTD.,established in 2003, is a specialized, refined, differentiated and innovative "Little Giant" enter
Read More