Business License
Contact Us
Your inquiry content must be between 10 to 5000 characters
Please enter Your valid email address
Zn‑Al Sputtering Target: Specifications, Process & Industrial Applications
Zn‑Al sputtering target is an important alloy sputtering source for magnetron sputtering thin‑film deposition. UVTM (UV Tech Material LTD.) supplies high‑quality zinc‑aluminum targets for global industrial and research customers.
The Zn‑Al target features a high purity of ≥99.99%, tested in accordance with the YS/T 935‑2013 standard for total main element purity. Two mainstream types are available: rotary target and planar target, covering diverse production and laboratory demands. Rotary targets deliver a material utilization rate of 70%‑80%+, ideal for continuous large‑scale industrial production. Planar targets have a material utilization rate of 20%‑40%, which is more suitable for laboratory research, sample testing and small‑batch production.
Two mature forming processes are adopted for Zn‑Al targets: melting casting and cold spray. The melting casting process is highly mature and stable, supporting standardized mass production with consistent internal composition. The cold spray is a solid‑state forming technology. Metal particles deposit and form target blanks through high‑speed impact plastic deformation without melting, effectively reducing element segregation and achieving uniform internal microstructure. It is suitable for high‑precision thin‑film preparation scenarios, while it has cost limitations for extra‑large‑size targets.
Zinc‑aluminum sputtering targets serve two core application fields. The first is the energy‑saving and smart glass industry. High‑quality functional films deposited by Zn‑Al targets endow architectural glass with stable heat insulation and optical adjustment performance, widely used in advanced building glass upgrading. The second is the superconducting and quantum electronics industry. The high‑purity Zn‑Al targets can be applied to the preparation of Josephson junction and superconducting quantum interference device (SQUID) thin films, minimizing impurity interference and supporting high‑end scientific research and prototype manufacturing.
For global buyers, target type, forming process and purity standard are the key selection factors. It is recommended to confirm equipment parameters and conduct sample tests before bulk ordering, so as to verify thin‑film performance and ensure stable production compatibility. UVTM provides reliable and standardized Zn‑Al sputtering target solutions for global industrial and scientific clients.Technical content supported by UVTM.
Recently Posted
-
AZO Sputtering Target Manufacturer in China for Transparent Conductive Films
October 27, 2026Aluminum-doped zinc oxide (AZO) is one of the core functional oxide targets for transparent conductive oxide (TCO) thin films, and
Read More -
99.999% Si Sputtering Target with Copper Backing — Stable Deposition for AR Film and Low-E Glass
October 22, 2026High-Purity Silicon, Engineered for Stable Thin-Film DepositionSilicon sputtering targets are the source material behind some of t
Read More -
Rotatable CuZn Sputtering Targets for Pure Copper Film Deposition
October 22, 2026Wherever a pure copper film is needed, copper-zinc alloy targets are the material of choice. Copper delivers high electrical condu
Read More -
Zn‑Sn Sputtering Targets for Energy‑Saving & Smart Glass Industry
October 19, 2026Zn‑Sn alloy sputtering targets are key raw materials for magnetron sputtering coating, widely used in the manufacturing of energy‑
Read More
Contact Us
Recommended Products
-
Rotatable AG Target High Quality Sputtering TargetNegotiableMOQ: 1 Piece -
Rotatable AZO Target High Quality Sputtering TargetNegotiableMOQ: 1 Piece
-
Manganese Cobalt Alloy Target, High Purity Manganese Cobalt Alloy Target for PVD Coating, Manganese Cobalt Sputtering TargetNegotiableMOQ: 1 Piece
-
Rotatable Tial Alloy Target, Magnetron Sputtering Target, Titanium Aluminum Alloy Tial Sputtering Target for Decoration CoatingNegotiableMOQ: 1 Piece
-
Chromium Target, Rotary Cr Target High Purity Chrome Tube, Chromium Tube Target for Vacuum DepositionNegotiableMOQ: 1 Piece
-
Rotary Nb2o5 TargetNegotiableMOQ: 1 Piece
-
Indium Oxide Trioxide In2o3 Powder 99.99%, High Purity Indium Trioxide Powder, In2o3 Indium Oxide Powder PriceNegotiableMOQ: 50 Kilograms
-
Nb Niobium Target for Thin Film Solar Industry Low-Emissivity Glass IndustryNegotiableMOQ: 1 Piece
-
99.99% High Purity Alsi Rotatable Alloy Target Aluminum Silicon Sputtering TargetNegotiableMOQ: 1 Piece
-
5n Indium Bonding Si Target With Cooper Backing PlateNegotiableMOQ: 1 Piece
-
Heterojunction ITO Target, High Purity ITO Sputtering Target for Heterojunction, 97: 3 Hjt ITO TargetNegotiableMOQ: 1 Piece
-
PVD Coating Ti Sputtering TargetNegotiableMOQ: 1 Piece
-
90: 10 Rotatable ITO Target High Purity Sputtering TargetNegotiableMOQ: 1 Piece
-
Rotary Indium Target in Sputtering TargetNegotiableMOQ: 1 Piece
-
99.99% High Purity Metal AG Silver Sputtering Target With Good Price, Planar AG Silver TargetNegotiableMOQ: 1 Piece
-
Rotatable Znal Alloy Target, Magnetron Sputtering TargetNegotiableMOQ: 1 Piece
-
PVD Target Aluminum Al Cylindrical Rotatable Sputter Target 99.999% Purity 2n-5n AvailableNegotiableMOQ: 1 Piece
-
Rotary Cu Target for Glass Vacuum PVD Coating Material.NegotiableMOQ: 1 Piece
-
Poly Mono Bonding Silicon Si Target Sputtering Target 5n 6n With Competitive PriceNegotiableMOQ: 1 Piece
-
High Quality Nickel Iron Alloy Target, Plasma Sputtering Target, Nifemo Alloy TagetNegotiableMOQ: 1 Piece
