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Magnesium Oxide (MgO) Planar Sputtering Target, 99.99% Min.
Among sputtering target product lines, oxide targets serve film requirements based on oxide systems. The product introduced here is a magnesium oxide (MgO) planar target with a minimum purity of 99.99% (wt%), supplied for the flat panel display industry and the precision optics industry, with exploratory applications in semiconductor electronics, energy storage and power battery, and superconducting and quantum electronics subject to customer-specific process requirements and process validation.
What does the purity figure mean? A minimum purity of 99.99% (wt%) means the total impurity level is controlled within 0.01%. A lower total impurity level helps reduce the probability of impurity-related film defects — a meaningful baseline that is better read together with batch-to-batch consistency rather than on its own.
What should be confirmed before ordering? The planar form is matched to the equipment's target position, with dimensions and thickness aligned against the equipment drawing. Purity and batch-consistency criteria, together with inspection methods, are normally agreed in writing before the first shipment. A small-batch trial on the actual line, with results compared against the targets in use, remains the practical way to evaluate a new batch.
Backed by a patent portfolio of more than 100 patents as of August 2026 and a standardized production base of over 35,000 square meters, UV Tech Material LTD. — a national-level "little giant" enterprise — has built large-scale production capability covering cold isostatic pressing + high-temperature sintering.
Enquiries for the MgO planar target are welcome. Share your equipment specifications and film requirements, and the applicable specifications and delivery arrangements can be confirmed upon request.
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