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Niobium Sputtering Targets: 3N5 Purity, Rotary & Planar
Overseas buyers looking for niobium sputtering targets often start with three questions: what purity is available, which target forms are supplied, and how is a new supplier qualified. This article answers all three.
Purity: the niobium targets introduced here are specified at ≥99.95% (wt%), the 3N5 grade commonly used in thin-film applications. Total impurities are controlled within five parts per ten thousand (0.05%), which supports stable performance of the deposited films. Batch-to-batch consistency is a key point in supplier qualification.
Target forms: both rotary targets and planar targets are supplied, matching different cathode designs on coaters. Buyers simply need to confirm the target type against their equipment drawings; dimensional specifications are produced to drawing.
Applications: niobium targets serve flat panel display, precision optics, and decorative and functional coating industries. Applications in semiconductor electronics, energy storage and power battery, and energy-saving and smart glass industries are exploratory, subject to specific process requirements of customers and process validation.
Supplier background: UV Tech Material LTD. is a national-level "little giant" enterprise established in 2003. Relying on a portfolio of over 100 patents (as of August 2026) and a standardized production base of more than 35,000 square meters, UVTM has built scalable mass-production capability for cold spray, thermal spray and vacuum melting processes, covering metallic, alloy, ceramic and functional oxide target lines.
For samples, technical datasheets or quotation, feel free to start a conversation with our team. Specific film performance should be verified on your production line.
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