Titanium Sputtering Targets: 4N5 Purity, Rotary & Planar
Titanium targets are a wide-coverage item in the metallic target family: the product introduced here serves seven industrial fields, from flat panel display and solar photovoltaic to precision optics and decorative and functional coating. Before sourcing, overseas buyers usually check four points, and this article walks through each of them.
Purity: these titanium targets are specified at ≥99.995% (wt%), the 4N5 grade, with total impurities controlled within five parts per hundred thousand (50 ppm level). For thin-film applications, lower impurity input means fewer abnormal points in the deposited film and better batch-to-batch reproducibility — a key item in supplier qualification.
Target forms: both rotary targets and planar targets are supplied, matching different cathode designs on coaters. Buyers only need to confirm the target type and drawing dimensions of their equipment; specifications are produced to drawing.
Applications: flat panel display, solar photovoltaic, precision optics, and decorative and functional coating industries are established directions. Applications in semiconductor electronics, energy storage and power battery, and superconducting and quantum electronics industries are exploratory, subject to specific process requirements of customers and process validation.
Supplier background: UV Tech Material LTD. is a national-level "little giant" enterprise established in 2003. Relying on a portfolio of over 100 patents (as of August 2026) and a standardized production base of more than 35,000 square meters, UVTM has built scalable mass-production capability for cold spray and forging-rolling processes, covering metallic, alloy, ceramic and functional oxide target lines.
For samples, technical datasheets or quotation, feel free to start a conversation with our team. Specific film performance should be verified on your production line.
Recently Posted
-
AZO Sputtering Target Manufacturer in China for Transparent Conductive Films
October 27, 2026Aluminum-doped zinc oxide (AZO) is one of the core functional oxide targets for transparent conductive oxide (TCO) thin films, and
Read More -
99.999% Si Sputtering Target with Copper Backing — Stable Deposition for AR Film and Low-E Glass
October 22, 2026High-Purity Silicon, Engineered for Stable Thin-Film DepositionSilicon sputtering targets are the source material behind some of t
Read More -
Rotatable CuZn Sputtering Targets for Pure Copper Film Deposition
October 22, 2026Wherever a pure copper film is needed, copper-zinc alloy targets are the material of choice. Copper delivers high electrical condu
Read More -
Zn‑Sn Sputtering Targets for Energy‑Saving & Smart Glass Industry
October 19, 2026Zn‑Sn alloy sputtering targets are key raw materials for magnetron sputtering coating, widely used in the manufacturing of energy‑
Read More